Light emitting device, light emitting device package including the device, and lighting apparatus including the package

ABSTRACT

A light emitting device of an embodiment includes a substrate, a light emitting structure disposed under the substrate, the light emitting structure including a first conductive semiconductor layer, an active layer, and a second conductive semiconductor layer, first and second electrodes respectively connected to the first and second conductive semiconductor layers, a metal reflecting layer disposed under the light emitting structure, and a first insulating layers disposed between the first electrode and the light emitting structure, between the first electrode and the second electrode, and between the first electrode and the metal reflecting layer, wherein the metal reflecting layer includes a first segment overlapped with the second electrode in a thickness direction of the light emitting structure and a second segment disposed with extending from the first segment.

TECHNICAL FIELD

Embodiments relate to a light emitting device, a light emitting devicepackage including the device, and a lighting apparatus including thepackage.

BACKGROUND ART

Light Emitting Diodes (LEDs) are semiconductor devices that convertelectricity into light using characteristics of compound semiconductorsso as to enable transmission/reception of signals, or that are used as alight source.

Group III-V nitride semiconductors are in the spotlight as corematerials of light emitting devices such as, for example, LEDs or LaserDiodes (LDs) due to physical and chemical characteristics thereof.

The LEDs do not include environmentally harmful materials such asmercury (Hg) that are used in conventional lighting appliances such as,for example, fluorescent lamps and incandescent bulbs, and thus are veryeco-friendly, and have several advantages such as, for example, longlifespan and low power consumption. As such, conventional light sourcesare being rapidly replaced with LEDs.

In case of a conventional light emitting device package having a flipchip bonding structure, a distributed Bragg reflector (DBR) is used toreflect light emitted from the active layer. At this time, variousproblems may arise due to the use of the DBR.

DISCLOSURE Technical Problem

Embodiments provide a light emitting device, a light emitting devicepackage including the device, and a lighting apparatus including thepackage, which have the improved luminous flux and the excellent heatemission characteristics, may be protected from a high electric field,have a short period for a manufacturing process thereof, and has minimalor no cracking or peeling.

Technical Solution

A light emitting device according to one embodiment may include asubstrate; a light emitting structure disposed under the substrate, thelight emitting structure including a first conductive semiconductorlayer, an active layer, and a second conductive semiconductor layer;first and second electrodes connected to the first and second conductivesemiconductor layers, respectively; a metal reflecting layer disposedunder the light emitting structure; and a first insulating layerdisposed between the first electrode and the light emitting structure,between the first electrode and the second electrode, and between thefirst electrode and the metal reflecting layer, wherein the metalreflecting layer includes: a first segment overlapped with the secondelectrode in a thickness direction of the light emitting structure; anda second segment disposed with extending from the first segment.

For example, the metal reflecting layer may have a cross-sectional shapesymmetrical with respect to the second electrode in a directionperpendicular to the thickness direction of the light emittingstructure.

For example, the second segment may include a second-first segmentoverlapped with the light emitting structure in the thickness direction;and a second 2-2 segment overlapped with the first-first insulatinglayer disposed between the first electrode and the light emittingstructure, in the thickness direction. In addition, the second segmentmay further include a second-third segment overlapped with the firstelectrode in the thickness direction.

For example, the metal reflecting layer may be disposed to beelectrically connected to the second electrode.

For example, the metal reflecting layer may be disposed to be separatedby a separation distance of an odd multiple of λ/(4n) (where, λrepresents a wavelength of light emitted from the active layer and nrepresents a refractive index of the first insulating layer) from asecond well layer of the active layer, in the thickness direction of thelight emitting structure. The separation distance may increase as thedistance from the second electrode increases. The separation distancemay increase stepwise.

For example, the metal reflecting layer 140 may have a curvedcross-sectional shape.

For example, the first insulating layer may include a first-firstinsulating layer disposed between the first electrode and a side wall ofthe light emitting structure; and a first-second insulating layerdisposed between the first electrode and the second electrode under eachof the first-first insulating layer and the light emitting structure.

For example, the light emitting device may further include a secondlight-transmitting conductive layer disposed between the metalreflecting layer and the first-second insulating layer.

For example, the metal reflecting layer and the second electrode mayinclude the same material. The light emitting device may further includefirst and second bonding pads connected to the first and secondelectrodes, respectively; and a second insulating layer disposed underthe metal reflecting layer with exposing the second electrode, thesecond insulating layer electrically isolating the metal reflectinglayer from the first bonding pad.

For example, at least two of the first-first insulating layer, thefirst-second insulating layer, or the second insulating layer mayinclude the same material.

A light emitting device according to another embodiment may include asubstrate; a light emitting structure disposed under the substrate, thelight emitting structure including a first conductive semiconductorlayer, an active layer, and a second conductive semiconductor layer;first and second electrodes connected to the first and second conductivesemiconductor layers, respectively; a metal reflecting layer disposedunder the light emitting structure; and a first insulating layerdisposed between the first electrode and the light emitting structure,between the first electrode and the second electrode, and between thefirst electrode and the metal reflecting layer, wherein the metalreflecting layer is disposed to be electrically isolated from the secondelectrode.

For example, the first insulating layer may include a first-firstinsulating layer disposed between the first electrode and a side wall ofthe light emitting structure; and a first-second insulating layerdisposed between the first electrode and the second electrode under eachof the first-first insulating layer and the light emitting structure,and further include a second light-transmitting conductive layerdisposed between the metal reflecting layer and the first-secondinsulating layer.

For example, a third insulating layer may be disposed between the metalreflecting layer and the second electrode.

A light emitting device package according to still further embodimentmay include the light emitting device, first and second lead framesconfigured to be electrically isolated from each other; a first solderportion configured to electrically connect the first conductivesemiconductor layer to the first lead frame; and a second solder portionconfigured to electrically connect the second conductive semiconductorlayer to the second lead frame.

A lighting apparatus according to still another embodiment may includethe light emitting device package.

Advantageous Effects

The light emitting device, the light emitting device package includingthe device, and the lighting apparatus including the package accordingto the embodiment may reflect light by using the metal reflecting layer,thereby not only having an improved luminous flux, solving the problemsinduced when using a distributed Bragg reflector (DBR), that is, themanufacturing process is complicated because DBR is sensitive toparticles, it is difficult to manufacture the DBR to a desired thicknessbecause the step coverage of the metal reflecting layer is uneven, themanufacturing process period is long, and cracks or peeling are caused,but also eliminating the possibility of being broken at a high electricfield because the metal reflecting layer serves as a field plate, andimproving heat release characteristics.

DESCRIPTION OF DRAWINGS

FIG. 1a is a cross-sectional view of a light emitting device packageaccording to one embodiment.

FIG. 1b is a cross-sectional view of a light emitting device packageaccording to another embodiment.

FIG. 2 is a plan view of a light emitting device shown in FIG. 1 a.

FIG. 3 is an enlarged cross-sectional view of the portion ‘A’ shown inFIG. 1 a.

FIG. 4a to FIG. 4i are cross-sectional views in process illustrating amethod of manufacturing the light emitting device shown in FIG. 1 a.

BEST MODE

Hereinafter, exemplary embodiments will be described in detail withreference to the accompanying drawings to aid in understanding of theembodiments. However, the embodiments may be altered in various ways,and the scope of the embodiments should not be construed as limited tothe following description. The embodiments are intended to provide thoseskilled in the art with more complete explanation.

In the following description of the embodiments, it will be understoodthat, when each element is referred to as being formed “on” or “under”the other element, it can be directly “on” or “under” the other elementor be indirectly formed with one or more intervening elementstherebetween. In addition, it will also be understood that “on” or“under” the element may mean an upward direction and a downwarddirection of the element.

In addition, the relative terms “first”, “second”, “top/upper/above”,“bottom/lower/under” and the like in the description and in the claimsmay be used to distinguish between any one substance or element andother substances or elements and not necessarily for describing anyphysical or logical relationship between the substances or elements or aparticular order.

FIG. 1a is a cross-sectional view of a light emitting device package 200according to an embodiment, and FIG. 2 is a plan view of a lightemitting device 100 shown in FIG. 1 a.

The light emitting device 100 shown in FIG. 1a corresponds to asectional view of the light emitting device 100 shown in taken along aline I-I′ of FIG. 2. For ease understanding, the first and secondthrough-holes TH1 and TH2 covered by the first and second bonding pads162 and 164 are shown by dotted lines in FIG. 2.

Referring to FIG. 1a , a light emitting device package 200 may include alight emitting device 100, first and second solder portions 172 and 174,first and second lead frames 182 and 184, an insulating portion 186, apackage body 188, and a molding member 190.

Referring to FIG. 1a to FIG. 2, the light emitting device 100 mayinclude a substrate 110, a light emitting structure 120, first andsecond electrodes 132 and 134, a first light-transmitting conductivelayer 136, a metal reflecting layer 140, a second light-transmittingconductive layer 142, first and second insulating layers 152 and 154,and first and second bonding pads 162 and 164.

The light emitting structure 120 may be disposed under the substrate110. The substrate 110 may include a conductive material ornon-conductive material. For example, the substrate 110 may include atleast one of sapphire (Al₂O₃), GaN, SiC, ZnO, GaP, InP, Ga₂O₃, GaAs, orSi. In addition, the substrate 110, for example, may be a patternedsapphire substrate (PSS) having a pattern (not shown) in order to help alight emitted from the active layer 124 to escape from the lightemitting device 100, but embodiment is not limited thereto.

In order to improve the difference in the coefficients of thermalexpansion (CTE) and the lattice mismatch between the substrate 110 andthe light emitting structure 120, a buffer layer (or a transitionlayer)(not illustrated) may be disposed between the two 110 and 120. Thebuffer layer, for example, may include at least one material selectedfrom the group consisting of Al, In, N, and Ga, without being limitedthereto. In addition, the buffer layer may have a single layer ormulti-layer structure.

The light emitting structure 120 may include a first conductivesemiconductor layer 122, an active layer 124, and a second conductivesemiconductor layer 126 which are sequentially disposed under thesubstrate 110.

The first conductive semiconductor layer 122 may be disposed under thesubstrate 110 and implemented in, for example, group III-V or II-VIcompound semiconductors doped with a first conductive dopant. When thefirst conductive semiconductor layer 122 is an n-type semiconductorlayer, the first conductive dopant may include Si, Ge, Sn, Se, or Te asan n-type dopant without being limited thereto.

For example, the first conductive semiconductor layer 122 may include asemiconductor material having a composition formula ofAl_(x)In_(y)Ga_((1-x-y))N (0≤x≤1, 0≤y≤1, 0≤x+y≤1). The first conductivesemiconductor layer 122 may include any one or more materials selectedfrom among GaN, InN, AlN, InGaN, AlGaN, InAlGaN, AlInN, AlGaAs, InGaAs,AlInGaAs, GaP, AlGaP, InGaP, AlInGaP, and InP.

The active layer 124 is disposed between the first conductivesemiconductor layer 122 and the second conductive semiconductor layer126. The active layer 124 is a layer in which electrons (or holes)injected through the first conductive semiconductor layer 122 and holes(or electrons) injected through the second conductive semiconductorlayer 126 meet each other to emit light having energy determined by aninherent energy band of a constituent material of the active layer 124.The active layer 124 may be formed into at least one structure of asingle-well structure, a multi-well structure, a single-quantum wellstructure, a multi-quantum well structure, a quantum wire structure, ora quantum dot structure.

The active layer 124 may include a well layer and a barrier layer havinga pair structure of any one or more of InGaN/GaN, InGaN/InGaN,GaN/AlGaN, InAlGaN/GaN, GaAs(InGaAs)/AlGaAs, and GaP(InGaP)/AlGaP,without being limited thereto. The well layer may be formed of amaterial having lower band gap energy than the band gap energy of thebarrier layer.

A conductive clad layer (not illustrated) may be formed above and/orunder the active layer 124. The conductive clad layer may be formed ofsemiconductors having higher band gap energy than the band gap energy ofthe barrier layer of the active layer 124. For example, the conductiveclad layer may include GaN, AlGaN, InAlGaN, or a super latticestructure. In addition, the conductive clad layer may be doped with ann-type or p-type dopant.

The second conductive semiconductor layer 126 may be disposed under theactive layer 124. The second conductive semiconductor layer 126 may beformed of a semiconductor compound, and may be formed of, for example,group III-V or II-VI compound semiconductors. For example, the secondconductive semiconductor layer 126 may include a semiconductor materialhaving a composition formula of In_(x)Al_(y)Ga_(1-x-y)N (0≤x≤1, 0≤y≤1,0≤x+y≤1). The second conductive semiconductor layer 126 may be dopedwith a second conductive dopant. When the second conductivesemiconductor layer 126 is a p-type semiconductor layer, the secondconductive dopant may include Mg, Zn, Ca, Sr, or Ba, etc., as a p-typedopant.

The first conductive semiconductor layer 122 may be an n-typesemiconductor layer, and the second conductive semiconductor layer 126may be a p-type semiconductor layer. Alternatively, the first conductivesemiconductor layer 122 may be a p-type semiconductor layer, and thesecond conductive semiconductor layer 126 may be an n-type semiconductorlayer.

The light emitting structure 120 may be implemented in any one structureselected from among an n-p junction structure, a p-n junction structure,an n-p-n junction structure, and a p-n-p junction structure.

Since each of the light emitting device packages 200 and 300 shown inFIG. 1a to FIG. 2 has a flip chip bonding structure, the light emittedfrom the active layer 124 is emitted through the substrate 110 and thefirst conductive semiconductor layer 122. For this, the substrate 110and the first conductive semiconductor layer 122 may be made of alight-transmitting material, and the second conductive semiconductorlayer 126 and the second electrode 134 may be made of alight-transmitting material or a light non-transmitting material.

The first electrodes 132 may be disposed under the first conductivesemiconductor layer 122, which is exposed by passing through the secondconductive semiconductor layer 126, the active layer 124, and a part ofthe first conductive semiconductor layer 122 to be electricallyconnected to the first conductive semiconductor layer 122. The firstelectrode 132 includes an ohmic contact material, and serve as an ohmiclayer. Thus, a separate ohmic layer (not illustrated) to be disposed maybe unnecessary, or a separate ohmic layer may be disposed between thefirst electrodes 132 and the first conductive semiconductor layer 122.

In addition, the first electrode 132 may be formed of any material thatmay not absorb the light emitted from the active layer 124, but that mayreflect or transmit the light and that may be grown to a good quality onthe first conductive semiconductor layer 122. For example, the firstelectrode 132 may be formed of a metal, and more specifically may beformed of Ag, Ni, Ti, Al, Rh, Pd, Ir, Ru, Mg, Zn, Pt, Au, Hf, Cr, or aselective combination thereof. For example, the first electrode 132 maybe implemented as Ti/Al/Ti/Ni/Ti, but the embodiment is not limitedthereto.

The second electrode 134 may be disposed under the second conductivesemiconductor layer 126 so as to be electrically connected to the secondconductive semiconductor layer 126. The second electrode 134 may beformed of Al, Au, Ag, Ni, Pt, Rh, Ti, Cr, or a metal layer including analloy including Al, Ag, Pt or Rh. For example, the second electrode 134may be implemented as Ag/Ni/Ti, but the embodiment is not limitedthereto.

The first light-transmitting conductive layer 136 may be disposedbetween the second electrode 134 and the second conductive semiconductorlayer 126. The first light-transmitting conductive layer 136 may serveas an ohmic layer. For this, the first light-transmitting conductivelayer 136 may be a transparent conductive oxide (TCO) layer. Forexample, the first light-transmitting conductive layer 136 may includeat least one of indium tin oxide (ITO), indium zinc oxide (IZO), indiumzinc tin oxide (IZTO), indium aluminum zinc oxide (IAZO), indium galliumzinc oxide (IGZO), indium gallium tin oxide (IGTO), aluminum zinc oxide(AZO), antimony tin oxide (ATO), gallium zinc oxide (GZO), IrOx, RuOx,RuOx/ITO, Ni/IrOx/Au, or Ni/IrOx/Au/ITO, but is not limited to thesematerials.

If the second electrode 134 may function as an ohmic layer, the firstlighting-transmitting conductive layer 136 may be omitted.

Meanwhile, the metal reflecting layer 140 may be disposed under thelight emitting structure 120 and play the role of reflecting lighttraveling in a lower direction (for example, the −z axis direction) ofthe light emitting structure 120.

In addition, the metal reflecting layer 140 may include the first andsecond segments S1 and S2.

The first segment S1 may mean to a part of the metal reflecting layer140 that is overlapped with the second electrode 134, in a thicknessdirection (e.g., the z-axis direction) (hereinafter, referred to as a‘first direction’) of the light emitting structure 120.

The second segment S2 may mean a part disposed with extending from thefirst segment S1 in the metal reflecting layer 140. At this time, thesecond segment S2 may include at least one of the second-first,second-second, and second-third segments S21, S22, or S23.

The second-first segment S21 may mean a part of the metal reflectinglayer 140 that is not vertically overlapped with the second electrode134 in the first direction, but vertically overlapped with the lightemitting structure 120. That is, the second-first segment S21 may mean apart except for the part overlapped with the second electrode 134 in thefirst direction of the vertical direction, among the parts of the metalreflecting layer 140 that are overlapped with the light emittingstructure 120 in the first direction of the vertical direction.

The second-second segment S22 may mean a part of the metal reflectinglayer 140 that is vertically overlapped in the first direction with thefirst-first insulating layer 152-1 disposed between the first electrode132 and the light emitting structure 120.

The second-third segment S23 may mean a part of the metal reflectinglayer 140 that is vertically overlapped with the first electrode 132 inthe first direction.

In addition, the metal reflecting layer 140 may have a cross-sectionalshape symmetrical with respect to the second electrode 134 in adirection (for example, an x-axis direction or a y-axis direction)perpendicular to the first direction. Hereinafter, the x-axis directionis referred to as a ‘second direction’ and the y-axis direction isreferred to as a ‘third direction.’ For example, as shown in FIG. 1a ,the metal reflecting layer 140 may have a cross-sectional shapesymmetrical with respect to the second electrode 134 in the seconddirection. However, according to another embodiment, the metalreflecting layer 140 may have a cross-sectional shape asymmetrical withrespect to the second electrode 134 in at least one direction of thesecond or third direction.

In addition, as shown in FIG. 1a , the metal reflecting layer 140 may bedisposed to be electrically connected to the second electrode 134. Thus,when the metal reflecting layer 140 is electrically connected to thesecond electrode 134, the metal reflecting layer 140 may perform areflection function for reflecting light, a heat dissipation function,and a function of the field plate later described.

Alternatively, as shown in FIG. 1b , a third insulating layer 156 may bedisposed between the metal reflecting layer 140 and the second electrode134 to electrically isolate the metal reflecting layer 140 from thesecond electrode 134. In this case, the metal reflecting layer 140 mayperform only a reflection function.

And, the third insulating layer 156 may include at least one of SiO₂,TiO₂, ZrO₂, Si₃N₄, Al₂O₃, or MgF₂.

FIG. 3 is an enlarged cross-sectional view of the portion ‘A’ shown inFIG. 1 a.

Referring to FIG. 3, the metal reflecting layer 140 may be disposed withbeing separated by the odd multiple of λ/(4n) from the second well layerof the active layer 124 in the first direction. Here, λ represents thewavelength of the light emitted from the active layer 124, and nrepresents the refractive index of the first insulating layer 152 (forexample, the first-second insulating layer 152-2). Thus, when the metalreflecting layer 140 is separated by the odd multiple of λ/(4n) from thesecond well layer of the active layer 124 in the first direction, thelight extraction efficiency of the light emitting device package 200 maybe maximized.

At least a portion of the second-first segment S21 of the metalreflecting layer 140 may be separated from the second well layer of theactive layer 124 by a first separation distance D1 in the firstdirection. At least a portion of the second-second and second-thirdsegments S22 and S23 may be separated from the second well layer of theactive layer 124 by a second separation distance D2 in the firstdirection. For example, the first separation distance D1 may be λi/(4n),and the second separation distance D2 may be λj/(4n). Where i and j areodd, and j may be greater than i.

In addition, the distance by which the metal reflecting layer 140 isseparated from the second well layer of the active layer 124 in thefirst direction may increase as the distance from the second electrode134 increases. For example, as shown in FIG. 1a , the distance by whichthe metal reflecting layer 140 is separated from the second well layerof the active layer 124 in the first direction may increase stepwise. Assuch, the metal reflecting layer 140 may have a curved cross-sectionalshape, but the embodiment is not limited thereto.

As described above, the light extraction efficiency may be maximizedwhen the metal reflecting layer 140 is arranged so as to be separatedfrom the second well layer of the active layer 124 by an odd multiple ofλ/(4n) in the first direction. The thicknesses of the first-first andfirst-second insulating layers 152-1 and 152-2 may be determined so asto satisfy the separation distance.

Referring to FIG. 1a and FIG. 1b , the metal reflecting layer 140 mayinclude the same material as or a different material from the secondelectrode 134 described above. For example, the metal reflecting layer140 may be formed of a metal such as Al, Au, Ag, Ni, Pt, Rh, Ti, Cr, ametal layer including an alloy including Al, Ag, Pt or Rh, but theembodiment is not limited thereto.

The first insulating layer 152 may be disposed between the firstelectrode 132 and the sidewall of the light emitting structure 120,between the first electrode 132 and the second electrode 134, andbetween the first electrode 132 and the metal reflecting layer 140,respectively.

The first insulating layer 152 may include a first-first insulatinglayer 152-1 and a first-second insulating layer 152-2. The first-firstinsulating layer 152-1 may be disposed between the first electrode 132and the side wall of the light emitting structure 120. Also, thefirst-first insulating layer 152-1 may be disposed with extending from aside wall of the light emitting structure 120 to under a lower edge ofthe light emitting structure 120.

The first-first insulating layer 152-1 may serve as a sort of currentblocking layer (CBL) and may play the role of electrically isolating thefirst electrode 132 from the side of the light emitting structure 120.For example, the first-first insulating layer 152-1 may include at leastone of SiO₂, TiO₂, ZrO₂, Si₃N₄, Al₂O₃, or MgF₂.

The first-second insulating layer 152-2 may be disposed between thefirst electrode 132 and the second electrode 134 under respective thefirst-first insulating layer 152-1 and the light emitting structure 120.The first electrode 132 and the second electrode 134 may be electricallyseparated from each other by disposing the first-second insulating layer152-2. For example, the first-second insulating layers 152-2 may includeat least one of SiO₂, TiO₂, ZrO₂, Si₃N₄, Al₂O₃, or MgF₂.

Further, the second light-transmitting conductive layer 142 may bedisposed between the metal reflecting layer 140 and the first-secondinsulating layer 152-2. Thus, when the second light-transmittingconductive layer 142 is disposed, the adhesion between the metalreflecting layer 140 and the first-second insulating layer 152-2 may beimproved. In some cases, the second light-transmitting conductive layer142 may be omitted.

The second light-transmitting conductive layer 142 may include the samematerial as or a different material from the first light-transmittingconductive layer 136, but the embodiment is not limited thereto.

The second light-transmitting conductive layer 142 may be a transparentconductive oxide (TCO) layer. For example, the second light-transmittingconductive layer 142 may include at least one of indium tin oxide (ITO),indium zinc oxide (IZO), indium zinc tin oxide (IZTO), indium aluminumzinc oxide (IAZO), indium gallium zinc oxide (IGZO), indium gallium tinoxide (IGTO), aluminum zinc oxide (AZO), antimony tin oxide (ATO),gallium zinc oxide (GZO), IrOx, RuOx, RuOx/ITO, Ni/IrOx/Au, orNi/IrOx/Au/ITO, but is not limited to these materials.

The second insulating layer 154 may be disposed under the metalreflecting layer 140 while forming the first and second through-holesTH1 and TH2. Here, the first through-hole TH1 exposes the firstelectrode 132 and the second through-hole TH2 exposes the secondelectrode 134. Each of the first and second through-holes TH1 and TH2may be a blind hole.

The second insulating layer 154 is disposed below the metal reflectinglayer 140 so that the metal reflecting layer 140 and the first bondingpad 162 may be electrically separated from each other.

In addition, the second insulating layer 154 may be disposed between thesecond bonding pad 164 and the metal reflecting layer 140. At this time,the second insulating layer 154 is not disposed between the secondelectrode 134 and the second bonding pad 164. However, according toanother embodiment, the second insulating layer 154 may not be disposedbetween the second bonding pad 164 and the metal reflecting layer 140.

The second insulating layer 154 may include at least one of SiO₂, TiO₂,ZrO₂, Si₃N₄, Al₂O₃, or MgF₂.

At least two of the first-first insulating layer 152-1, the first-secondinsulating layer 152-2, or the second insulating layer 154 may includethe same material. For example, all of the first-first insulating layer152-1, the first-second insulating layer 152-2, and the secondinsulating layer 154 may be made of the same material. Alternatively,the first-first insulating layer 152-1 and the first-second insulatinglayer 152-2 may be made of the same material, and the second insulatinglayer 154 may be made of the material different from each of thefirst-first insulating layer 152-1 and the first-second insulating layer152-2.

The first bonding pad 162 may be embedded in the first through-hole TH1defined by the second insulating layer 154 and may be electricallyconnected to the first electrode 132. That is, the first bonding pad 162may be electrically connected to the first conductive semiconductorlayer 122 through the first electrode 132.

The second bonding pad 164 may be embedded in the second through-holeTH2 defined by the second insulating layer 154 to be electricallyconnected to the second electrode 134. That is, the second bonding pad164 may be electrically connected to the second conductive semiconductorlayer 126 through the second electrode 134.

The first bonding pad 162 and the second bonding pad 164 may be disposedwith being spaced apart from each other in a second or third directionorthogonal to the first direction.

Each of the first and second bonding pads 162 and 164 may include ametallic material having electrical conductivity and may include thesame material as or a different material from each of the first andsecond electrodes 132 and 134. Each of the first and second bonding pads162 and 164 may include at least one of Ti, Ni, Au, or Sn, but theembodiment is not limited thereto. For example, each of the first andsecond bonding pads 162 and 164 may be implemented as a form ofTi/Ni/Ti/Ni/Cu/Ni/Au.

The first and second lead frames 182 and 184 may be electricallyisolated from each other by an insulating portion 186. The first leadframe 182 may be electrically connected to the first bonding pad 162 viathe first solder portion 172 and the second lead frame 184 may beelectrically connected to the second bonding pad 164 through the secondsolder portion 174. The first and second lead frames 182 and 184 may beelectrically isolated from each other by the insulating portion 186.Each of the first and second lead frames 182 and 184 may be made of aconductive material, e.g., metal, and the embodiment is not limited tothe type of material of each of the first and second lead frames 182 and184.

The insulating portion 186 may be disposed between the first and secondlead frames 182 and 184 to electrically isolate the first and secondlead frames 182 and 184 from each other. For this purpose, theinsulating portion 186 may include at least one of SiO₂, TiO₂, ZrO₂,Si₃N₄, Al₂O₃, or MgF₂, but embodiment is not limited thereto.

The first solder part 172 may be disposed between the first bonding pad162 and the first lead frame 182, in order to play the role ofelectrically connecting the first bonding pad 162 to the first leadframe 182. The first solder part 172 is electrically connected to thefirst conductive semiconductor layer 122 via the first bonding pad 162and the first electrode 132. Accordingly, the first solder part 172 mayelectrically connect the first conductive semiconductor layer 122 to thefirst lead frame 182.

The second solder portion 174 may be disposed between the second bondingpad 164 and the second lead frame 184 in order to play the role ofelectrically connect the second bonding pad 164 to the second lead frame184. The second solder part 174 is electrically connected to the secondconductive semiconductor layer 126 via the second bonding pad 164, thesecond electrode 134, and the first light-transmitting conductive layer136. Accordingly, the second solder portion 174 may electrically connectthe second conductive semiconductor layer 126 to the second lead frame184.

Each of the first and second solder portions 172 and 174 may be a solderpaste or a solder ball, but the embodiment is not limited thereto. Insome cases, the first solder portion 172 and the second solder portion174 may be omitted. In this case, the first bonding pad 162 may serve asthe first solder portion 172, and the second bonding pad 164 may serveas the second solder portion 174. That is, when the first solder part172 and the second solder part 174 are omitted, the first bonding pad162 may be directly connected to the first lead frame 182, and thesecond bonding pad 164 may be directly connected to the second leadframe 184.

In addition, the package body 188 may define the cavity C with the firstand second lead frames 182 and 184, but the embodiment is not limitedthereto. According to another embodiment, the cavity C may be definedwith only the package body 188. Alternatively, a barrier wall (notshown) may be disposed on the package body 188 having a flat uppersurface, and a cavity may be defined by the barrier wall and the uppersurface of the package body 188.

The light emitting device 100 may be disposed in the cavity C as shownin FIGS. 1a and 1 b.

The package body 188 may be formed of silicon, synthetic resin, ormetal. The first and second lead frames 182 and 184 may be a part of thepackage body 188 if the package body 188 is made of a conductivematerial, for example a metallic material. Even in this case, thepackage bodies 188 forming the first and second lead frames 182 and 184may be electrically separated from each other by the insulating portion186.

In addition, the molding member 190 may be arranged to surround andprotect the light emitting device 100 disposed in the cavity C. Themolding member 190 may be formed of, for example, silicon (Si), and mayconvert the wavelength of light emitted from the light emitting device100 because it includes a fluorescent substance. Although thefluorescent substance may include a fluorescent material of anywavelength conversion portion that may convert the light generated inthe light emitting device 100 into white light such as a YAG-based,TAG-based, silicate-based, sulfide-based, or nitride-based fluorescentsubstance, the embodiment is not limited as to the type of thefluorescent substance.

The YGA-based and TAG-based fluorescent substances may be selected fromamong (Y, Tb, Lu, Sc, La, Gd, Sm)3(Al, Ga, In, Si, Fe)5(O, S)12:Ce, andthe silicate-based fluorescent substance may be selected from among (Sr,Ba, Ca, Mg)2SiO4:(Eu, F, Cl).

In addition, the sulfide-based fluorescent substances may be selectedfrom among (Ca, Sr)S:Eu, (Sr, Ca, Ba)(Al, Ga)2S4:Eu, and thenitride-based fluorescent substances may be selected from among (Sr, Ca,Si, Al, O)N:Eu (e.g., CaAlSiN4:Eu β-SiAlON:Eu) or Ca-α SiAlON:Eu-based(Cax, My)(Si, Al)12(O, N)16 (here, M is at least one of Eu, Tb, Yb orEr, 0.05<(x+y)<0.3, 0.02<x<0.27, and 0.03<y<0.3, which is fluorescentsubstance).

Red fluorescent substances may be nitride-based fluorescent substancesincluding N (e.g., CaAlSiN3:Eu). The nitride-based red fluorescentssubstance have higher reliability in resistance to external environmentssuch as, for example, heat and moisture, and lower discoloration riskthan sulfide-based fluorescent substance.

Hereinafter, a method of manufacturing the light emitting device 100shown in FIG. 1a will be described with reference to FIG. 4a to FIG. 4ias follows, but the embodiment is not limited thereto. That is, thelight emitting device 100 shown in FIG. 1A, of course, may bemanufactured by another manufacturing method.

FIGS. 4a to 4i are cross-sectional views in process illustrating amethod of manufacturing the light emitting device 100 shown in FIG. 1 a.

Referring to FIG. 4a , a light emitting structure 120 may be formed bysequentially laminating a first conductive semiconductor layer 122, anactive layer 124, and a second conductive semiconductor layer 126 on asubstrate 110.

The substrate 110 may include a conductive material or non-conductivematerial. For example, the substrate 110 may include at least one ofsapphire (Al₂O₃), GaN, SiC, ZnO, GaP, InP, Ga₂O₃, GaAs, or Si.

The light emitting structure 120 may be formed by sequentially disposinga first conductive semiconductor layer 122, an active layer 124, and asecond conductive semiconductor layer 126 on the substrate 110.

The first conductive semiconductor layer 122 may be formed by usinggroup III-V or II-VI compound semiconductors, etc., doped with a firstconductive dopant. When the first conductive semiconductor layer 122 isan n-type semiconductor layer, the first conductive dopant may includeSi, Ge, Sn, Se, or Te as an n-type dopant, without being limitedthereto.

For example, the first conductive semiconductor layer 122 may be formedby using a semiconductor material having a composition formula ofAl_(x)In_(y)Ga_((1-x-y))N (0≤x≤1, 0≤y≤1, 0≤x+y≤1). The first conductivesemiconductor layer 122 may be formed by using any one or more materialsselected from among GaN, InN, AlN, InGaN, AlGaN, InAlGaN, AlInN, AlGaAs,InGaAs, AlInGaAs, GaP, AlGaP, InGaP, AlInGaP, and InP.

The active layer 124 may be formed into at least one structure selectedfrom among a single-well structure, a multi-well structure, asingle-quantum well structure, a multi-quantum well structure, a quantumwire structure, and a quantum dot structure.

A well layer and a barrier layer of the active layer 124 may be formedto have a pair structure of any one or more of InGaN/GaN, InGaN/InGaN,GaN/AlGaN, InAlGaN/GaN, GaAs(InGaAs)/AlGaAs, and GaP(InGaP)/AlGaP,without being limited thereto. The well layer may be formed of amaterial having lower band gap energy than the band gap energy of thebarrier layer.

A conductive clad layer (not illustrated) may be formed above and/orunder the active layer 124. The conductive clad layer may be formed ofsemiconductors having higher band gap energy than the band gap energy ofthe barrier layer of the active layer 124. For example, the conductiveclad layer may include GaN, AlGaN, InAlGaN, or a super latticestructure. In addition, the conductive clad layer may be doped with ann-type or p-type dopant.

The second conductive semiconductor layer 126 may be formed of asemiconductor compound, and may be formed of group III-V or II-VIcompound semiconductors, etc. For example, the second conductivesemiconductor layer 126 may include a semiconductor material having acomposition formula of In_(x)Al_(y)Ga_(1-x-y)N (0≤x≤1, 0≤y≤1, 0≤x+y≤1).The second conductive semiconductor layer 126 may be doped with a secondconductive dopant. When the second conductive semiconductor layer 126 isa p-type semiconductor layer, the second conductive dopant may includeMg, Zn, Ca, Sr, or Ba, etc., as a p-type dopant.

Subsequently, referring to FIG. 4b , the third through-hole TH3 exposingthe first conductive semiconductor layer 122 may be formed bymesa-etching the second conductive semiconductor layer 126, the activelayer 124, and the first conductive semiconductor layer 122. Since thethird through-hole TH3 is formed, the sides of the second conductivesemiconductor layer 126 and the active layer 124 of the light emittingstructure 120 may be exposed in the third through-hole TH3.

Subsequently, referring to FIG. 4c , the first-first insulating layer152-1 may be formed to surround the sidewall and the upper edge of thelight emitting structure 120 exposed in the third through-hole TH3 andto expose an upper portion of a second conductive semiconductor layer126 on which the first light-transmitting conductive layer 136 is to beformed.

For example, the first-first insulating layer 152-1 may include at leastone of SiO₂, TiO₂, ZrO₂, Si₃N₄, Al₂O₃, or MgF₂.

Subsequently, referring to FIG. 4d , a first light-transmittingconductive layer 136 is formed on the second conductive semiconductorlayer 126 exposed by the first-first insulating layer 152-1. Forexample, the first light-transmitting conductive layer 136 may be formedby depositing ITO on the second conductive semiconductor layer 126exposed by the first-first insulating layer 152-1 and then performingheat treatment.

The first light-transmitting conductive layer 136 may be a transparentconductive oxide (TCO) layer. For example, the first light-transmittingconductive layer 136 may be formed by using at least one of indium tinoxide (ITO), indium zinc oxide (IZO), indium zinc tin oxide (IZTO),indium aluminum zinc oxide (IAZO), indium gallium zinc oxide (IGZO),indium gallium tin oxide (IGTO), aluminum zinc oxide (AZO), antimony tinoxide (ATO), gallium zinc oxide (GZO), IrOx, RuOx, RuOx/ITO, Ni/IrOx/Au,or Ni/IrOx/Au/ITO, but is not limited to these materials.

Subsequently, referring to FIG. 4e , a first electrode 132 is formed onthe first conductive semiconductor layer 122 not covered and exposed bythe first-first insulating layer 152-1, with being buried in the thirdthrough-hole TH3. The first electrode 132 may be formed of a metal andmay be implemented by Ag, Ni, Ti, Al, Rh, Pd, Ir, Ru, Mg, Zn, Pt, Au,Hf, Cr, or a selective combination thereof.

Subsequently, referring to FIG. 4f , a second electrode 134 is formed onthe first light-transmitting conductive layer 136. The second electrode134 may be formed of a metal such as Al, Au, Ag, Ni, Pt, Rh, Ti, Cr, Ora metal layer containing an alloy including Al, Ag, Pt or Rh.

Subsequently, referring to FIG. 4g , the first-second insulating layer152-2 is formed on the light emitting structure 120 with covering a sideand an upper portion of the first-first insulating layer 152-1 whileexposing the upper region of the second electrode 134. The first-secondinsulating layer 152-2 may include the same material as or a differentmaterial from the first-first insulating layer 152-1. For example, thefirst-second insulating layers 152-2 may be formed using at least one ofSiO₂, TiO₂, ZrO₂, Si₃N₄, Al₂O₃, or MgF₂.

Subsequently, referring to FIG. 4h , a metal reflecting layer 140 isformed on the upper portion of the second electrode 134, which is notcovered and exposed by the first-second insulating layer 152-2, and onthe first-second insulating layer 152-2. In order to improve theadhesion between the metal reflecting layer 140 and the first-secondinsulating layer 152-2, the second light-transmitting conductive layer142 may be further formed on the first-second insulating layer 152-2,before the metal reflecting layer 140 is formed. However, according toanother embodiment, the formation of the second light-transmittingconductive layer 142 may be omitted.

The metal reflecting layer 140 may include the same material as or adifferent material from the second electrode 134 described above. Forexample, the metal reflecting layer 140 may be formed of a metal such asAl, Au, Ag, Ni, Pt, Rh, Ti, Cr, or a metal layer including an alloyincluding Al, Ag, Pt, or Rh, but the embodiment is not limited thereto.

The second light-transmitting conductive layer 142 may be formed usingthe same material as or a different material from the firstlight-transmitting conductive layer 136 described above, but theembodiment is not limited thereto. The second light-transmittingconductive layer 142 may a transparent conductive oxide (TCO) layer. Forexample, the second light-transmitting conductive layer 142 may beformed using at least one of indium tin oxide (ITO), indium zinc oxide(IZO), indium zinc tin oxide (IZTO), indium aluminum zinc oxide (IAZO),indium gallium zinc oxide (IGZO), indium gallium tin oxide (IGTO),aluminum zinc oxide (AZO), antimony tin oxide (ATO), gallium zinc oxide(GZO), IrOx, RuOx, RuOx/ITO, Ni/IrOx/Au, or Ni/IrOx/Au/ITO, but is notlimited to these materials.

Subsequently, referring to FIG. 4i , the second insulating layer 154 maybe formed on the resultant structure shown in FIG. 4h with defining thefirst through-hole TH1 exposing the upper portion of the first electrode132 and the second through-hole TH2 exposing the upper portion of thesecond electrode 134. The second insulating layer 154 may be formed ofthe same material as or a different material from each of thefirst-first and first-second insulating layers 152-1 and 152-2. Thesecond insulating layer 154 may be formed using at least one of SiO₂,TiO₂, ZrO₂, Si₃N₄, Al₂O₃, or MgF₂.

Subsequently, referring to FIG. 1a to FIG. 2, a first bonding pad 162 isembedded in the first through-hole TH1 and a second bonding pad 164 isembedded in the second through-hole TH2 so that the light emittingdevice 100 may be completed.

Each of the first and second bonding pads 162 and 164 may include ametallic material having electrical conductivity and may include thesame material as or different material from each of the first and secondelectrodes 132 and 134. Each of the first and second bonding pads 162and 164 may be formed using at least one of Ti, Ni, Au, or Sn, but theembodiment is not limited thereto.

Each of the light emitting device packages 200 and 300 according to theabove-described embodiments has a flip chip bonding type structure.Therefore, in order to emitting the light emitted from the active layer124 in the upper direction (for example, the +z-axis direction) or inthe side direction (for example, the x-axis direction), it is necessaryto reflect toward the upper direction light traveling in the lowerdirection (for example, the −z-axis direction). Therefore, in the caseof the light emitting device package 200 or 300 according to theembodiment, the luminous flux may be improved by reflecting the lightupward using the metal reflecting layer 140. For example, as marked byan arrow OL in FIG. 3, the light emitted from the active layer 124 isreflected by the first electrode 132, and then reflected by the metalreflecting layer 140, and then again reflected by the first electrode132, and then may be emitted upwardly.

Also, when a Distributed Bragg Reflector (DBR) (not shown) is usedinstead of the metal reflecting layer 140 in the embodiment, to reflectlight, the following problems may be caused.

The DBR is sensitive to particle. Therefore, when particles are presentin the process for manufacturing DBR, the DBR may not be formedproperly. However, when the metal reflecting layer 140 is used as in theembodiment instead of the DBR, the metal reflecting layer 140 is notsensitive to the particles unlike the DBR so that the manufacturingprocess conditions are not complicated.

In addition, the DBR may be generally manufactured by a physical vapordeposition (PVD) method. Due to the nature of the PVD method, the stepcoverage of the DBR becomes poor. However, in general, in order for theDBR to perform its function, the DBR must have a desired thickness.Therefore, the light reflecting ability of the DBR having poor stepcoverage may be degraded. However, according to the embodiment, sincethe metal reflecting layer 140 used in place of the DBR has good stepcoverage, the reflection ability of the metal reflecting layer 140 isnot degraded. For example, the metal reflecting layer 140 may bemanufactured by a sputtering method so that the step coverage of themetal reflecting layer 140 is good. As a result, when the metalreflecting layer 140 is used as in the embodiment instead of the DBR,the restriction in the thickness may be solved.

Also, while the process for manufacturing the DBR takes a long time, theprocess for manufacturing the metal reflecting layer 140 may beperformed in a relatively short time. Therefore, according to theembodiment, since the metal reflecting layer 140 is used in place of theDBR, the manufacturing process time may be shortened.

In addition, when the DBR is used, cracks or peeling may occur in thelight emitting device package due to a difference of thermal expansioncoefficients or the thermal stress of the thin films. However, accordingto the embodiment, since the metal reflecting layer 140 is used insteadof the DER, the problem of cracking or peeling may be solved.

In addition, when the metal reflecting layer 140 is not disposed, a veryhigh electric field E1 is concentrated on the interface B between thesecond electrode 134 and the first-second insulating layer 152-2 byelectrostatic discharge (ESD) etc., thereby destroying the lightemitting device package. In contrast, referring to FIG. 3, in the caseof the light emitting device package 200 according to the embodiment,the metal reflecting layer 140 is disposed to be electrically connectedto the second electrode 134 to which the second conductive type carriers(for example, holes (+)) are supplied. Since the second conductive typecarriers are present in the metal reflecting layer 140 as describedabove, first conductive type carriers (for example, electrons (−)) aredriven to one side 152A of the first-second insulating layers 152-2contacting the metal reflecting layer 140. Therefore, the secondconductive type carriers (for example, holes (+)) are driven to theother side 152B of the first-first insulating layer 152-1 which is theopposite side of the first-second insulating layer 152-2. Therefore, thefirst conductive type carriers (for example, electrons (−)) are driveninto the second conductive semiconductor layer 126 that is in contactwith the other side 152B of the first-first insulating layer 152-1.

As a result, a potential difference is caused in the second-firstsegment S21 of the metal reflecting layer 140 as shown so that the peakpotential (or the peak electric field) is suppressed (i.e., shieldingeffect). Therefore, the electric field E may be reduced to the secondelectric field E2 which is lower than the first electric field E1 of thecase that the metal reflecting layer 140 is not present. In this way,the metal reflecting layer 140 may play the role of preventing the lightemitting device package 200 from being broken.

In addition, silver (Ag) is a substance having very high heatconductivity among metals. In considering that, when the metalreflecting layer 140 is formed of a material having high heatconductivity such as silver and the surface area of the metal reflectinglayer 140 is widened, the thermal resistance of the light emittingdevice package 200 decreases, thereby improving thermal releasecharacteristics.

In the light emitting device package according to the embodiment, anarray of a plurality of light emitting device packages may be disposedon a board, and optical members such as a light guide plate, a prismsheet, and a diffuser sheet may be disposed in an optical path of thelight emitting device packages. The light emitting device packages, theboard, and the optical members may function as a backlight unit.

In addition, the light emitting device package according to theembodiment may be applied to a display apparatus, an indicatorapparatus, and a lighting apparatus.

Here, the display apparatus may include a bottom cover, a reflectiveplate disposed on the bottom cover, a light emitting module configuredto emit light, a light guide plate disposed in front of the reflectiveplate to forwardly guide light emitted from the light emitting module,optical sheets including prism sheets disposed in front of the lightguide plate, a display panel disposed in front of the optical sheets, animage signal output circuit connected to the display panel to supply animage signal to the display panel, and a color filter disposed in frontof the display panel. Here, the bottom cover, the reflective plate, thelight emitting module, the light guide plate, and the optical sheets mayconstitute a backlight unit.

In addition, the lighting apparatus may include a light source modulewhich includes a board and the light emitting device package accordingto the embodiment, a radiator configured to radiate heat of the lightsource module, and a power supply unit configured to process or convertan electrical signal from an external source so as to supply the same tothe light source module. For example, the lighting apparatus may includea lamp, a headlamp, or a streetlight.

The headlamp may include a light emitting module which includes thelight emitting device packages arranged on a board, a reflectorconfigured to reflect light, emitted from the light source module, in agiven direction, for example, forwardly, a lens configured to forwardlyrefract light reflected by the reflector, and a shade configured toachieve a light distribution pattern selected by a designer by blockingor reflecting some of light, reflected by the reflector and directed tothe lens.

Although embodiments have been described with reference to a number ofillustrative embodiments thereof, it should be understood that numerousother modifications and embodiments can be devised by those skilled inthe art that will fall within the spirit and scope of the principles ofthis disclosure. More particularly, various variations and modificationsare possible in the component parts and/or arrangements of the subjectcombination arrangement within the scope of the disclosure, the drawingsand the appended claims. In addition to variations and modifications inthe component parts and/or arrangements, alternative uses will also beapparent to those skilled in the art.

MODE FOR INVENTION

Various embodiments have been described in the best mode for carryingout the invention.

INDUSTRIAL APPLICABILITY

The light emitting device and the light emitting device packageincluding the device according to the embodiment may be not broken at ahigh electric field by serving the metal reflecting layer as a fieldplate and applied to the display apparatus, the indicator apparatus, andthe lighting apparatus having the improved thermal releasecharacteristics.

1. A light emitting device, comprising: a substrate; a light emittingstructure disposed under the substrate, the light emitting structureincluding a first conductive semiconductor layer, an active layer, and asecond conductive semiconductor layer; first and second electrodesconnected to the first and second conductive semiconductor layers,respectively; a metal reflecting layer disposed under the light emittingstructure; and a first insulating layer disposed between the firstelectrode and the light emitting structure, between the first electrodeand the second electrode, and between the first electrode and the metalreflecting layer, wherein the metal reflecting layer comprises: a firstsegment overlapped with the second electrode in a thickness direction ofthe light emitting structure; and a second segment disposed withextending from the first segment to under the first electrode.
 2. Thelight emitting device according to claim 1, wherein the metal reflectinglayer has a cross-sectional shape symmetrical with respect to the secondelectrode in a direction perpendicular to the thickness direction of thelight emitting structure.
 3. The light emitting device according toclaim 1, wherein the second segment comprises: a second-first segmentoverlapped with the light emitting structure in the thickness direction;and a second 2-2 segment overlapped with a portion disposed between thefirst electrode and the light emitting structure among the firstinsulating layer, in the thickness direction.
 4. The light emittingdevice according to claim 3, wherein the second segment furthercomprises a second-third segment overlapped with the first electrode inthe thickness direction.
 5. The light emitting device according to claim1, wherein the metal reflecting layer is disposed to be electricallyconnected to the second electrode.
 6. The light emitting deviceaccording to claim 1, wherein the metal reflecting layer is disposed tobe separated by a separation distance of an odd multiple of λ/(4n)(where, λ represents a wavelength of light emitted from the active layerand n represents a refractive index of the first insulating layer) froma second well layer of the active layer, in the thickness direction ofthe light emitting structure.
 7. The light emitting device according toclaim 6, wherein the separation distance increases as the distance fromthe second electrode increases.
 8. The light emitting device accordingto claim 6, wherein the separation distance increases stepwise.
 9. Thelight emitting device according to claim 1, wherein the metal reflectinglayer 140 has a curved cross-sectional shape.
 10. The light emittingdevice according to claim 1, wherein the first insulating layercomprises: a first-first insulating layer disposed between the firstelectrode and a side wall of the light emitting structure; and afirst-second insulating layer disposed between the first electrode andthe second electrode under each of the first-first insulating layer andthe light emitting structure.
 11. The light emitting device according toclaim 10, further comprising a second light-transmitting conductivelayer disposed between the metal reflecting layer and the first-secondinsulating layer.
 12. The light emitting device according to claim 1,wherein the metal reflecting layer and the second electrode comprise thesame material.
 13. The light emitting device according to claim 10,further comprising: first and second bonding pads connected to the firstand second electrodes, respectively; and a second insulating layerdisposed under the metal reflecting layer with exposing the secondelectrode, the second insulating layer electrically isolating the metalreflecting layer from the first bonding pad.
 14. The light emittingdevice according to claim 13, wherein at least two of the first-firstinsulating layer, the first-second insulating layer, or the secondinsulating layer have the same material.
 15. A light emitting device,comprising: a substrate; a light emitting structure disposed under thesubstrate, the light emitting structure including a first conductivesemiconductor layer, an active layer, and a second conductivesemiconductor layer; first and second electrodes connected to the firstand second conductive semiconductor layers, respectively; a metalreflecting layer disposed with extending from the light emittingstructure to under the first electrode; and a first insulating layerdisposed between the first electrode and the light emitting structure,between the first electrode and the second electrode, and between thefirst electrode and the metal reflecting layer, wherein the metalreflecting layer is disposed to be electrically isolated from the secondelectrode.
 16. The light emitting device according to claim 15, whereinthe first insulating layer comprises: a first-first insulating layerdisposed between the first electrode and a side wall of the lightemitting structure; and a first-second insulating layer disposed betweenthe first electrode and the second electrode under each of thefirst-first insulating layer and the light emitting structure.
 17. Thelight emitting device according to claim 16, further comprising a secondlight-transmitting conductive layer disposed between the metalreflecting layer and the first-second insulating layer.
 18. The lightemitting device according to claim 15, further comprising a thirdinsulating layer disposed between the metal reflecting layer and thesecond electrode.
 19. A light emitting device package, comprising: thelight emitting device according to claim 1, first and second lead framesconfigured to be electrically isolated from each other; a first solderportion configured to electrically connect the first conductivesemiconductor layer to the first lead frame; and a second solder portionconfigured to electrically connect the second conductive semiconductorlayer to the second lead frame.
 20. A lighting apparatus comprising thelight emitting device package according to claim 19.